Plasma Analytic Solutions

   

 













 

 Å½Ä§À» ÀÌ¿ëÇÑ Àü±â½ÅÈ£ ºÐ¼®¹æ½Ä   Electrical diagnostic Tool  
 ½Ç½Ã°£ ÇöóÁ º¯¼ö ÃøÁ¤   Real time plasma measurement
 °øÁ¤°¡½º ÇöóÁ ÃøÁ¤ (CF4, SF6, BF3, Cl2, BCl3¡¦)   Plasma diagnostics in real processing plasmas
 Tip depo »óȲ¿¡µµ ÃøÁ¤°¡´É
 ÃøÁ¤ º¯¼ö : Plasma parameter, Surface related parameter (tip or chamber wall surface)  
 Àû¿ë ±â¼ú : Floating Harmonic Method

 

 

¡á  General Langmuir Probe principle

     •  I-V Characteristic Curve
          * Ion, electron densities, electron temperatures from the I-V curve
          * Diagnostics for only non deposition plasma

                        

¡á  Wise Probe : Floating Harmonic Method

                    

     •  Basic principle
            *  Nonlinearity in plasma-sheath characteristics
            *  
Te found using the ratio of ¥ø / 2¥ø of the probe current by applying  the sinusoidal voltage (¥ø)
                to the probe though  the blockingcapacitor which holds the DC potential at the floating potential.

                       [Ref]  M. H. Lee, S. H. Jang and C. W. Chung, J. Appl. Phys., 101, 033305 (2007)

                                             

       •  Maxwellianelectron distribution & floating condition

                            

 

¡á  Comparison with Langmuir probes

       
•  Electron Temperatures @ RF Powers  (Argon 20mTorr)

                    

          
•  Ion Densities @ RF Powers  (Argon 20mTorr)

                        

 

           

  133-791 ¼­¿ïƯº°½Ã ¼ºµ¿±¸ Çà´çµ¿ 17¹øÁö HIT B107È£  ÇǾؿ¡ÀÌ ¼Ö·ç¼ÇÁî   TEL 070-8251-0344

  HIT B107, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul, 133-791, KOREA